magnetron

Boron carbon nitride ( BCN ) thin films were deposited by radio frequency ( RF ) magnetron sputtering .

采用射频 磁控溅射 技术制备出硼碳氮 ( BCN ) 薄膜.

Ti - O film was prepared by microwave - electron convolute resonance ( MW - ECR ) magnetron filter arc deposition process.

采用微波电子回旋 共振 磁过滤弧设备制备钛氧薄膜.

Its principle and some other aredescribed, including the magnetron sputter coater and the osmium plasma coater.

本文将主要叙述等离子溅射镀膜的原理与方法,并且简单介绍磁控管溅射仪和锇等离子镀膜仪等.

Methods: The nature HA films were prepared by electron beam evaporation and rf - magnetron sputtering techniques.

方法: 用电子束蒸发和射频磁控溅射两种技术制备了天然HA薄膜.

The silicon thin films on glass substrate were prepared using microwave ECR source enhanced magnetron sputtering.

利用微波ECR等离子体增强磁控溅射沉积技术在玻璃表面制备了硅膜.

The generator represents magnetron , packaged with constants and electromagnets ( 2 coils magnetic ) in the magnetic - shielded ceramic - metal execution.

该磁控管的设计采用电磁石,封装采用金属陶瓷.

Thin film manganin gages and ytterbium gages were fabricated by magnetron sputtering.

采用磁控溅射法制备锰铜薄膜,溅射和真空蒸发法制备镱薄膜.

Suitable for making heating element for electrical oven and magnetron.

适用于制作电气炉发热元件等.

Magnetron is often used as microwave power source in clinical linac magnetron.

在医用直线加速器中通常都采用磁控管作为微波功率源.

In the fourth chapter Sb - doped TiO 2 thin films prepared by DC reactive magnetron sputtering were studied.

第五章研究了直流磁控溅射制备Sb掺杂 TiO2的成膜特点.

Si rich SiO 2 films have been prepared by a rf magnetron sputter method.

用射频磁控溅射法制备了富硅二氧化硅薄膜.

Silicon dioxide thin films were prepared by reactive RF magnetron sputtering on silicon substrate.

采用磁控射频反应溅射法在单晶硅片上制备了二氧化硅薄膜.

The kinetic process of reactive magnetron sputtering has been studied.

研究了反应磁控溅射的动力学过程.

The generator represents magnetron, packaged with constant magnets in ceramic - metal execution.

该磁控管采用金属陶瓷封装,装有永磁体.

Niobium oxide optical thin films have been prepared by low frequency reactive magnetron sputtering system.

利用低频反应磁控溅射制备五氧化二铌光学薄膜.